Laser-assisted chemical vapour deposition of TiSi2: aspects of deposition and etching
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منابع مشابه
Laser-assisted chemical vapour deposition of TiSi2: aspects of deposition and etching
Lines of TiSi, were written on Si(100) substrates by using a focused Ar+-laser. The reaction gas mixture consisted of TiCl, and H, and the substrate was used a s the silicon source. The laser deposited TiSi, lines were examined as a function of the deposition parameters. Especially the initial reactions have been studied b varying the the writing speed in a wide range. The C-54 phase of TiSi, w...
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ژورنال
عنوان ژورنال: Le Journal de Physique IV
سال: 1993
ISSN: 1155-4339
DOI: 10.1051/jp4:1993330